Research/Patents/US 5286976
US 5286976

MICROSTRUCTURE DESIGN FOR HIGH IR SENSITIVITY

Assignee

HONEYWELL INC., A CORP. OF DE

Filed

Nov 7, 1988

Granted

Feb 15, 1994

Location

BLOOMINGTON MN US

Abstract

A microstructure design for high IR sensitivity having a two level infrared bolometer microstructure, the lower level having a reflective metal film surface such as Pt, Au, or Al to reflect IR penetrating to that level, the upper level being separated from the lower level by an air gap of about 1-2 microns which allows the reflected IR to interfere with the incident IR and increase the sensitivity to a higher level.

Source: Google Patents

35 USC §181 Secrecy Order

Imposed

Jun 6, 1990

Rescinded

Jul 1, 1992

Duration

2 years

Inventor

  • 1BARRETT E. COLE

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Back to patent indexSource: USPTO 35 USC §181 secrecy order records