DEPLETION MODE POWER MOSFET WITH REFRACTORY GATE AND METHOD OF MAKING SAME
Assignee
INTERNATIONAL RECTIFIER CORPORATION
Filed
Feb 25, 1988
Granted
Dec 5, 1995
Location
El Segundo CA (Aerospace Corp/TRW)
Abstract
A depletion mode power MOSFET has a gate electrode formed of material that is refractory, or resistant, to high temperature encountered during device fabrication. A depletion channel region which is formed in a base region of a MOSFET and which interconnects the source and drain regions is formed after a high temperature drive to form the base region, but before a gate oxide and gate and source electrodes are formed at lower temperatures. The depletion channel region is thus subjected to reduced temperatures and grows only slightly in thickness, so that it can be easily depleted. The gate oxide, similarly, is subjected to reduced temperatures, and, particularly when made thin, exhibits high insensitivity to radiation exposure.
Source: Google Patents
35 USC §181 Secrecy Order
Imposed
Nov 29, 1988
Rescinded
Jul 13, 1993
Duration
4 years, 7 months
Inventor
- 1DANIEL M. KINZER
Sensitive facility: El Segundo CA (Aerospace Corp/TRW)
Record Details
- Patent number
- US 5472888
- Application
- 07160172
- Aerospace match
- No
- Dataset source
- 35 USC §181 SO records