SOURCE AND METHOD FOR GENERATING HIGH-DENSITY PLASMA WITH INDUCTIVE POWER COUPLING
Assignee
TEXAS INSTRUMENTS INCORPORATED, A CORP. OF DE
Filed
Jun 29, 1992
Granted
Mar 14, 1995
Location
DALLAS TX US
Abstract
A source and method for generating high density plasma with inductive radio-frequency power coupling is provided in which coil antenna sections (34) within a plasma source (12) are used to generate a high-density uniform plasma. This plasma is then guided into transferred in a transfer chamber (14) and then to a processing chamber (16). Within the processing chamber (16), the plasma reacts with a semiconductor wafer (18) or another workpiece for plasma-enhanced deposition or etch processing.
Source: Google Patents
35 USC §181 Secrecy Order
Imposed
Jun 16, 1993
Rescinded
Jun 29, 1993
Duration
13 days
Inventor
- 1MEHRDAD M. MOSLEHI
Record Details
- Patent number
- US 5397962
- Application
- 07905982
- Aerospace match
- Yes
- Dataset source
- 35 USC §181 SO records
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