HIGH RESOLUTION METAL PATTERNING OF ULTRA-THIN FILMS ON SOLID SUBSTRATES
Assignee
UNITED STATES OF AMERICA, THE AS REPRESENTED BY THE SECRETARY OF THE NAVY
Filed
Mar 6, 1987
Granted
Dec 31, 1991
Location
BURKE VA US
Abstract
A process for producing metal plated paths on a solid substrate of the kind which has polar functional groups at its surface utilizes a self-assembling monomolecular film that is chemically adsorbed on the substrate's surface. The solid substrate may, for example, be an insulator of the kind used for substrates in printed circuitry or may, as another example, be a semiconductor of the kind used in semiconductor microcircuitry. The chemical reactivity in regions of the ultra-thin film is altered to produce a desired pattern in the film. A catalytic precursor which adheres only to those regions of the film having enough reactivity to bind the catalyst is applied to the film's surface. The catalyst coated structure is then immersed in an electrolers plating bath where metal plates onto the regions activated by the catalyst.
Source: Google Patents
35 USC §181 Secrecy Order
Imposed
May 9, 1988
Rescinded
Mar 5, 1991
Duration
2 years, 10 months
Inventor
- 1JOEL M. SCHNUR
Record Details
- Patent number
- US 5077085
- Application
- 07022439
- Aerospace match
- No
- Dataset source
- 35 USC §181 SO records