US 4612211
SELECTIVE SEMICONDUCTOR COATING AND PROTECTIVE MASK THEREFOR
Assignee
RCA CORPORATION, A DE CORP.
Filed
Dec 20, 1983
Granted
Sep 16, 1986
Location
TRENTON NJ US
Abstract
An improved method of selectively depositing coatings onto bodies of semiconductor material employs as a protective mask an alkyl ester of a sulfosuccinate salt. The mask material is applied to areas which are to be kept free of the coatings. The overspray of a desired coating, onto the protective mask is deposited in a cracked, non-continuous manner, as opposed to the smooth crystalline layer being deposited over the semiconductor body. This overspray coating can be readily removed.
Source: Google Patents
35 USC §181 Secrecy Order
Imposed
Apr 29, 1985
Rescinded
Mar 13, 1986
Duration
10 months
Inventor
- 1FRANK Z. HAWRYLO
Record Details
- Patent number
- US 4612211
- Application
- 06563627
- Aerospace match
- No
- Dataset source
- 35 USC §181 SO records
Browse by Assignee
RCA CORPORATION, A DE CORP.Back to patent indexSource: USPTO 35 USC §181 secrecy order records